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8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor

Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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    Buy cheap 8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor from wholesalers
     
    Buy cheap 8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor from wholesalers
    • Buy cheap 8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor from wholesalers
    • Buy cheap 8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor from wholesalers
    • Buy cheap 8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor from wholesalers
    • Buy cheap 8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor from wholesalers
    • Buy cheap 8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor from wholesalers
    • Buy cheap 8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor from wholesalers

    8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor

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    Brand Name : Forged
    Model Number : customized
    Certification : ISO9001:2008
    Price : can be negotiate
    Payment Terms : T/T, Western Union, MoneyGram,, L/C, D/P, D/A
    Supply Ability : 50MT/month
    Delivery Time : 1-30 days
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    8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor

    niobium target purity 99.95% merchandise on hand customization


    Niobium Target Introduction
    With the characteristics of corrosion resistance, high temperature resistance and malleability, niobium target is widely used in coating industry, electronics industry, steel industry, chemical industry, optics, gemstone manufacturing, superconducting technology, aerospace. technology and other fields. Niobium target and sheet is the most common form of Nb product.
    Niobium Target Production Technology

    Refined by electron-beam, niobium targets are produced from niobium ingots. The target fabrication includes: mechanical deformation, machining (trimming and plane milling), vacuum re-crystallization annealing and finishing chemical treatment.

    Higher density of target material is usually required in order to reduce the stomata in the material and improve the performance of the sputter film. The density affects not only the sputtering rate, but also the electrical and optical properties of the film. The higher the density of target material is, the better the film performance works.

    In addition, enhancing density and strength of the target material can withstand the thermal stress better during the sputtering process. Density is also one of the key performance indicators of the target material.


    Commodity Name99.95% High Purity Niobium Disc
    Sizecustomizable
    SurfacePolish and bright
    Purity99.95%
    Density8.6g/cm3
    ApplicationSteel, superconducting material, aerospace, atomic energy, etc
    Advantage

    1) good superconductivity material

    2) Higher melting point

    3) Better Corrosion Resitance

    4) Better wear-resisting

    TechnologyPowder Metallurgy
    Lead timeaccording to the quantity and material
    Quality 8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor for sale
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